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The phenomenology of dielectric breakdown in thin silicon dioxide films: Al cathodes and p‐type Si anodes
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10.1063/1.344133
/content/aip/journal/jap/66/7/10.1063/1.344133
http://aip.metastore.ingenta.com/content/aip/journal/jap/66/7/10.1063/1.344133
/content/aip/journal/jap/66/7/10.1063/1.344133
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/content/aip/journal/jap/66/7/10.1063/1.344133
1989-10-01
2014-10-02
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: The phenomenology of dielectric breakdown in thin silicon dioxide films: Al cathodes and p‐type Si anodes
http://aip.metastore.ingenta.com/content/aip/journal/jap/66/7/10.1063/1.344133
10.1063/1.344133
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