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Effects of oxygen partial pressure during deposition on the properties of ion‐beam‐sputtered indium‐tin oxide thin films
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10.1063/1.345017
/content/aip/journal/jap/67/8/10.1063/1.345017
http://aip.metastore.ingenta.com/content/aip/journal/jap/67/8/10.1063/1.345017
/content/aip/journal/jap/67/8/10.1063/1.345017
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/content/aip/journal/jap/67/8/10.1063/1.345017
1990-04-15
2014-08-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effects of oxygen partial pressure during deposition on the properties of ion‐beam‐sputtered indium‐tin oxide thin films
http://aip.metastore.ingenta.com/content/aip/journal/jap/67/8/10.1063/1.345017
10.1063/1.345017
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