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rf glow discharge of SiF4‐H2 mixtures: Diagnostics and modeling of the a‐Si plasma deposition process
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10.1063/1.347623
/content/aip/journal/jap/69/10/10.1063/1.347623
http://aip.metastore.ingenta.com/content/aip/journal/jap/69/10/10.1063/1.347623
/content/aip/journal/jap/69/10/10.1063/1.347623
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/content/aip/journal/jap/69/10/10.1063/1.347623
1991-05-15
2014-08-27
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: rf glow discharge of SiF4‐H2 mixtures: Diagnostics and modeling of the a‐Si plasma deposition process
http://aip.metastore.ingenta.com/content/aip/journal/jap/69/10/10.1063/1.347623
10.1063/1.347623
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