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Thermal behavior of fluorine in SiO2 and Si investigated by the  19F(p,αγ) 16O reaction and secondary‐ion mass spectrometry
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10.1063/1.349392
/content/aip/journal/jap/70/4/10.1063/1.349392
http://aip.metastore.ingenta.com/content/aip/journal/jap/70/4/10.1063/1.349392
/content/aip/journal/jap/70/4/10.1063/1.349392
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/content/aip/journal/jap/70/4/10.1063/1.349392
1991-08-15
2014-10-02
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Thermal behavior of fluorine in SiO2 and Si investigated by the  19F(p,αγ) 16O reaction and secondary‐ion mass spectrometry
http://aip.metastore.ingenta.com/content/aip/journal/jap/70/4/10.1063/1.349392
10.1063/1.349392
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