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Etching processes of tungsten in SF6‐O2 radio‐frequency plasmas
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10.1063/1.350347
/content/aip/journal/jap/70/6/10.1063/1.350347
http://aip.metastore.ingenta.com/content/aip/journal/jap/70/6/10.1063/1.350347
/content/aip/journal/jap/70/6/10.1063/1.350347
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/content/aip/journal/jap/70/6/10.1063/1.350347
1991-09-15
2014-09-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Etching processes of tungsten in SF6‐O2 radio‐frequency plasmas
http://aip.metastore.ingenta.com/content/aip/journal/jap/70/6/10.1063/1.350347
10.1063/1.350347
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