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Modeling of agglomeration in polycrystalline thin films: Application to TiSi2 on a silicon substrate
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10.1063/1.351333
/content/aip/journal/jap/71/2/10.1063/1.351333
http://aip.metastore.ingenta.com/content/aip/journal/jap/71/2/10.1063/1.351333
/content/aip/journal/jap/71/2/10.1063/1.351333
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/content/aip/journal/jap/71/2/10.1063/1.351333
1992-01-15
2014-07-11
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Modeling of agglomeration in polycrystalline thin films: Application to TiSi2 on a silicon substrate
http://aip.metastore.ingenta.com/content/aip/journal/jap/71/2/10.1063/1.351333
10.1063/1.351333
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