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New high‐contrast developers for poly(methyl methacrylate) resist
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10.1063/1.350831
/content/aip/journal/jap/71/8/10.1063/1.350831
http://aip.metastore.ingenta.com/content/aip/journal/jap/71/8/10.1063/1.350831
/content/aip/journal/jap/71/8/10.1063/1.350831
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/content/aip/journal/jap/71/8/10.1063/1.350831
1992-04-15
2015-07-05
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: New high‐contrast developers for poly(methyl methacrylate) resist
http://aip.metastore.ingenta.com/content/aip/journal/jap/71/8/10.1063/1.350831
10.1063/1.350831
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