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Tantalum nitride films as resistors on chemical vapor deposited diamond substrates
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10.1063/1.353747
/content/aip/journal/jap/73/10/10.1063/1.353747
http://aip.metastore.ingenta.com/content/aip/journal/jap/73/10/10.1063/1.353747
/content/aip/journal/jap/73/10/10.1063/1.353747
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/content/aip/journal/jap/73/10/10.1063/1.353747
1993-05-15
2015-07-01
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Tantalum nitride films as resistors on chemical vapor deposited diamond substrates
http://aip.metastore.ingenta.com/content/aip/journal/jap/73/10/10.1063/1.353747
10.1063/1.353747
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