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Diffusion of dopants in B‐ and Sb‐delta‐doped Si films grown by solid‐phase epitaxy
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10.1063/1.354583
/content/aip/journal/jap/74/5/10.1063/1.354583
http://aip.metastore.ingenta.com/content/aip/journal/jap/74/5/10.1063/1.354583
/content/aip/journal/jap/74/5/10.1063/1.354583
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/content/aip/journal/jap/74/5/10.1063/1.354583
1993-09-01
2015-08-28
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Diffusion of dopants in B‐ and Sb‐delta‐doped Si films grown by solid‐phase epitaxy
http://aip.metastore.ingenta.com/content/aip/journal/jap/74/5/10.1063/1.354583
10.1063/1.354583
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