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Reactive ion etching profile and depth characterization using statistical and neural network analysis of light scattering data
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10.1063/1.354516
/content/aip/journal/jap/74/6/10.1063/1.354516
http://aip.metastore.ingenta.com/content/aip/journal/jap/74/6/10.1063/1.354516
/content/aip/journal/jap/74/6/10.1063/1.354516
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/content/aip/journal/jap/74/6/10.1063/1.354516
1993-09-15
2014-08-01
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Reactive ion etching profile and depth characterization using statistical and neural network analysis of light scattering data
http://aip.metastore.ingenta.com/content/aip/journal/jap/74/6/10.1063/1.354516
10.1063/1.354516
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