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Control of powder formation in silane discharge by cathode heating and hydrogen dilution for high‐rate deposition of hydrogenated amorphous silicon thin films
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10.1063/1.354371
/content/aip/journal/jap/74/7/10.1063/1.354371
http://aip.metastore.ingenta.com/content/aip/journal/jap/74/7/10.1063/1.354371
/content/aip/journal/jap/74/7/10.1063/1.354371
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/content/aip/journal/jap/74/7/10.1063/1.354371
1993-10-01
2014-07-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Control of powder formation in silane discharge by cathode heating and hydrogen dilution for high‐rate deposition of hydrogenated amorphous silicon thin films
http://aip.metastore.ingenta.com/content/aip/journal/jap/74/7/10.1063/1.354371
10.1063/1.354371
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