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Copper silicide precipitation influenced by the strain of a Ge0.02Si0.98 heteroepitaxial layer
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10.1063/1.355791
/content/aip/journal/jap/75/10/10.1063/1.355791
http://aip.metastore.ingenta.com/content/aip/journal/jap/75/10/10.1063/1.355791
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/content/aip/journal/jap/75/10/10.1063/1.355791
1994-05-15
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Copper silicide precipitation influenced by the strain of a Ge0.02Si0.98 heteroepitaxial layer
http://aip.metastore.ingenta.com/content/aip/journal/jap/75/10/10.1063/1.355791
10.1063/1.355791
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