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Polycrystalline silicon thin films processed with silicon ion implantation and subsequent solid‐phase crystallization: Theory, experiments, and thin‐film transistor applications
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10.1063/1.356131
/content/aip/journal/jap/75/7/10.1063/1.356131
http://aip.metastore.ingenta.com/content/aip/journal/jap/75/7/10.1063/1.356131
/content/aip/journal/jap/75/7/10.1063/1.356131
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/content/aip/journal/jap/75/7/10.1063/1.356131
1994-04-01
2014-09-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Polycrystalline silicon thin films processed with silicon ion implantation and subsequent solid‐phase crystallization: Theory, experiments, and thin‐film transistor applications
http://aip.metastore.ingenta.com/content/aip/journal/jap/75/7/10.1063/1.356131
10.1063/1.356131
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