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Hydrogen incorporation in silicon nitride films deposited by remote electron‐cyclotron‐resonance chemical vapor deposition
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10.1063/1.358930
/content/aip/journal/jap/77/3/10.1063/1.358930
http://aip.metastore.ingenta.com/content/aip/journal/jap/77/3/10.1063/1.358930
/content/aip/journal/jap/77/3/10.1063/1.358930
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/content/aip/journal/jap/77/3/10.1063/1.358930
1995-02-01
2014-09-02
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Hydrogen incorporation in silicon nitride films deposited by remote electron‐cyclotron‐resonance chemical vapor deposition
http://aip.metastore.ingenta.com/content/aip/journal/jap/77/3/10.1063/1.358930
10.1063/1.358930
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