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Kr incorporation in sputtered amorphous Si layers
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10.1063/1.358641
/content/aip/journal/jap/77/7/10.1063/1.358641
http://aip.metastore.ingenta.com/content/aip/journal/jap/77/7/10.1063/1.358641
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/content/aip/journal/jap/77/7/10.1063/1.358641
1995-04-01
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Kr incorporation in sputtered amorphous Si layers
http://aip.metastore.ingenta.com/content/aip/journal/jap/77/7/10.1063/1.358641
10.1063/1.358641
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