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Photoelastic waveguides and the controlled introduction of strain in III‐V semiconductors by means of thin film technology
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10.1063/1.360657
/content/aip/journal/jap/78/1/10.1063/1.360657
http://aip.metastore.ingenta.com/content/aip/journal/jap/78/1/10.1063/1.360657
/content/aip/journal/jap/78/1/10.1063/1.360657
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/content/aip/journal/jap/78/1/10.1063/1.360657
1995-07-01
2014-08-27
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Photoelastic waveguides and the controlled introduction of strain in III‐V semiconductors by means of thin film technology
http://aip.metastore.ingenta.com/content/aip/journal/jap/78/1/10.1063/1.360657
10.1063/1.360657
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