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Growth and characterization of anodic oxides on Si(100) formed in 0.1 M hydrochloric acid
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10.1063/1.362502
/content/aip/journal/jap/79/11/10.1063/1.362502
http://aip.metastore.ingenta.com/content/aip/journal/jap/79/11/10.1063/1.362502
/content/aip/journal/jap/79/11/10.1063/1.362502
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/content/aip/journal/jap/79/11/10.1063/1.362502
1996-06-01
2015-08-04
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Growth and characterization of anodic oxides on Si(100) formed in 0.1 M hydrochloric acid
http://aip.metastore.ingenta.com/content/aip/journal/jap/79/11/10.1063/1.362502
10.1063/1.362502
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