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Properties of amorphous and crystalline thin films deposited on Si from a precursor
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10.1063/1.367277
/content/aip/journal/jap/83/9/10.1063/1.367277
http://aip.metastore.ingenta.com/content/aip/journal/jap/83/9/10.1063/1.367277
/content/aip/journal/jap/83/9/10.1063/1.367277
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/content/aip/journal/jap/83/9/10.1063/1.367277
1998-05-01
2015-09-01
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Properties of amorphous and crystalline Ta2O5 thin films deposited on Si from a Ta(OC2H5)5 precursor
http://aip.metastore.ingenta.com/content/aip/journal/jap/83/9/10.1063/1.367277
10.1063/1.367277
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