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Silicide formation in the Ta/Ti/Si system by reaction of codeposited Ta and Ti with Si (100) and Si (111) substrates
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10.1063/1.369283
/content/aip/journal/jap/85/3/10.1063/1.369283
http://aip.metastore.ingenta.com/content/aip/journal/jap/85/3/10.1063/1.369283
/content/aip/journal/jap/85/3/10.1063/1.369283
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/content/aip/journal/jap/85/3/10.1063/1.369283
1999-02-01
2014-08-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Silicide formation in the Ta/Ti/Si system by reaction of codeposited Ta and Ti with Si (100) and Si (111) substrates
http://aip.metastore.ingenta.com/content/aip/journal/jap/85/3/10.1063/1.369283
10.1063/1.369283
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