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Low dielectric constant films prepared by plasma-enhanced chemical vapor deposition from tetramethylsilane
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10.1063/1.369677
/content/aip/journal/jap/85/6/10.1063/1.369677
http://aip.metastore.ingenta.com/content/aip/journal/jap/85/6/10.1063/1.369677
/content/aip/journal/jap/85/6/10.1063/1.369677
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/content/aip/journal/jap/85/6/10.1063/1.369677
1999-03-15
2014-11-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Low dielectric constant films prepared by plasma-enhanced chemical vapor deposition from tetramethylsilane
http://aip.metastore.ingenta.com/content/aip/journal/jap/85/6/10.1063/1.369677
10.1063/1.369677
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