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Raman scattering from very thin Si layers of superlattices: Experimental evidence of structural modification in the 0.8–3.5 nm thickness region
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10.1063/1.371567
/content/aip/journal/jap/86/10/10.1063/1.371567
http://aip.metastore.ingenta.com/content/aip/journal/jap/86/10/10.1063/1.371567
/content/aip/journal/jap/86/10/10.1063/1.371567
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/content/aip/journal/jap/86/10/10.1063/1.371567
1999-11-15
2014-10-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Raman scattering from very thin Si layers of Si/SiO2 superlattices: Experimental evidence of structural modification in the 0.8–3.5 nm thickness region
http://aip.metastore.ingenta.com/content/aip/journal/jap/86/10/10.1063/1.371567
10.1063/1.371567
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