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Analysis of high-resolution x-ray diffraction in semiconductor strained layers
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10.1063/1.370805
/content/aip/journal/jap/86/2/10.1063/1.370805
http://aip.metastore.ingenta.com/content/aip/journal/jap/86/2/10.1063/1.370805
/content/aip/journal/jap/86/2/10.1063/1.370805
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/content/aip/journal/jap/86/2/10.1063/1.370805
1999-07-15
2014-11-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Analysis of high-resolution x-ray diffraction in semiconductor strained layers
http://aip.metastore.ingenta.com/content/aip/journal/jap/86/2/10.1063/1.370805
10.1063/1.370805
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