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Accurate determination of pulsed current waveform in plasma immersion ion implantation processes
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10.1063/1.371259
/content/aip/journal/jap/86/7/10.1063/1.371259
http://aip.metastore.ingenta.com/content/aip/journal/jap/86/7/10.1063/1.371259
/content/aip/journal/jap/86/7/10.1063/1.371259
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/content/aip/journal/jap/86/7/10.1063/1.371259
1999-10-01
2014-10-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Accurate determination of pulsed current waveform in plasma immersion ion implantation processes
http://aip.metastore.ingenta.com/content/aip/journal/jap/86/7/10.1063/1.371259
10.1063/1.371259
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