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Surface reaction probability during fast deposition of hydrogenated amorphous silicon with a remote silane plasma
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10.1063/1.372342
/content/aip/journal/jap/87/7/10.1063/1.372342
http://aip.metastore.ingenta.com/content/aip/journal/jap/87/7/10.1063/1.372342
/content/aip/journal/jap/87/7/10.1063/1.372342
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/content/aip/journal/jap/87/7/10.1063/1.372342
2000-04-01
2014-09-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Surface reaction probability during fast deposition of hydrogenated amorphous silicon with a remote silane plasma
http://aip.metastore.ingenta.com/content/aip/journal/jap/87/7/10.1063/1.372342
10.1063/1.372342
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