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Electrical behavior of ultra-low energy implanted boron in silicon
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10.1063/1.373817
/content/aip/journal/jap/88/3/10.1063/1.373817
http://aip.metastore.ingenta.com/content/aip/journal/jap/88/3/10.1063/1.373817
/content/aip/journal/jap/88/3/10.1063/1.373817
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/content/aip/journal/jap/88/3/10.1063/1.373817
2000-08-01
2014-11-28
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Electrical behavior of ultra-low energy implanted boron in silicon
http://aip.metastore.ingenta.com/content/aip/journal/jap/88/3/10.1063/1.373817
10.1063/1.373817
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