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Study on Ge/Si ratio, silicidation, and strain relaxation of high temperature sputtered structures
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10.1063/1.1305832
/content/aip/journal/jap/88/4/10.1063/1.1305832
http://aip.metastore.ingenta.com/content/aip/journal/jap/88/4/10.1063/1.1305832
/content/aip/journal/jap/88/4/10.1063/1.1305832
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/content/aip/journal/jap/88/4/10.1063/1.1305832
2000-08-15
2014-10-26
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Study on Ge/Si ratio, silicidation, and strain relaxation of high temperature sputtered Co/Si1−xGex structures
http://aip.metastore.ingenta.com/content/aip/journal/jap/88/4/10.1063/1.1305832
10.1063/1.1305832
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