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Epitaxial films grown by pulsed laser deposition and reactive ion beam sputtering techniques
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10.1063/1.1287227
/content/aip/journal/jap/88/5/10.1063/1.1287227
http://aip.metastore.ingenta.com/content/aip/journal/jap/88/5/10.1063/1.1287227
/content/aip/journal/jap/88/5/10.1063/1.1287227
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/content/aip/journal/jap/88/5/10.1063/1.1287227
2000-09-01
2015-09-02
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Epitaxial Bi3Fe5O12(001) films grown by pulsed laser deposition and reactive ion beam sputtering techniques
http://aip.metastore.ingenta.com/content/aip/journal/jap/88/5/10.1063/1.1287227
10.1063/1.1287227
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