Index of content:
Volume 89, Issue 10, 15 May 2001
- PLASMAS AND ELECTRICAL DISCHARGES (PACS 51-52)
Effect of ion energy on photoresist etching in an inductively coupled, traveling wave driven, large area plasma source89(2001); http://dx.doi.org/10.1063/1.1364648View Description Hide Description
We report on the effect of ion energy on photoresistetching in an inductively coupled large area plasma source driven by a 13.56 MHz traveling wave with oxygen gas. To control the ion energy at the substrate surface, the electrode on which the substrate is placed is independently driven by a capacitively coupled 1 MHz power source. The etch rate increases with increasing ion energy for gas pressure ranging from 1 to 100 mTorr. Ion-induced desorption rate constants (etch yields) are shown to be proportional to the square root of the ion energy. An increase in the ion energy leads to etch-uniformity improvement over the processing area of 40 cm×50 cm, particularly at a low gas pressure of 5 mTorr. A modified photoresistetch kinetics model combined with a spatially-varying oxygen discharge model is used to explain these experimental results.
89(2001); http://dx.doi.org/10.1063/1.1365942View Description Hide Description
Inductively coupled plasmaetching of InP in is demonstrated. The dependence of etch rates on composition, radio frequency power and etching pressure is presented. An optimized process is developed and shown to be suitable for the slow, well-controlled, etching of InP-based nanostructures, while yielding excellent surface morphology.
Control of the well-type radial potential profile in the magnetized plasma flow produced by a dc discharge89(2001); http://dx.doi.org/10.1063/1.1361239View Description Hide Description
The control of the well-type radial potential profile in a dc plasma by applying bias potential, to the end plate is investigated experimentally. The experimental evidence that a plasma space potential, increases at the circumference of the plasma with the increase of is interpreted qualitatively by the experimental results of the current drawn by the segmented end plate, and of the relationship of to For the dc discharge the value of at the center of the plasma is naturally settled on the value somewhat lower than the anode potential, the electron sheath therefore appears in front of the end plate and expands radially as is increased. Electrons are drawn from the circumference of the plasma to the end plate, inducing the nonambipolar radial electron flux. Since the cross-field electron mobility is not sufficiently large, the inwardly directed radial electric field becomes stronger. The role of electron sheath formed is crucial in actively controlling the radial potential profile in the dc plasma.