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thick films grown on sapphire by using a multistep sputtering process
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10.1063/1.1378332
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    1 Département Matériaux pour Intégration en Microélectronique et Microsystémes (MIMM)-Le Mont, Institut Universitaire de Technologie de Valenciennes, Houy Valenciennes, Cedex F-59309, France
    2 Laboratoire de Chimie du Solide et Inorganique Moléculaire (LCSIM-UMR 6511), Université de Rennes I, Avenue du Général Leclerc, Rennes cedex F-35042, France
    3 Laboratoire d’Etude et de Recherche sur les Matériaux (LERMAT-CNRS) ISMRA Bd Maréchal Juin, Caen cedex F-14050, France
    J. Appl. Phys. 90, 5274 (2001); http://dx.doi.org/10.1063/1.1378332
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/content/aip/journal/jap/90/10/10.1063/1.1378332
2001-11-15
2014-09-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: LiNbO3 thick films grown on sapphire by using a multistep sputtering process
http://aip.metastore.ingenta.com/content/aip/journal/jap/90/10/10.1063/1.1378332
10.1063/1.1378332
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