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Boron penetration and thermal instability of polycrystalline- metal-oxide-semiconductor structures
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10.1063/1.1419207
/content/aip/journal/jap/91/1/10.1063/1.1419207
http://aip.metastore.ingenta.com/content/aip/journal/jap/91/1/10.1063/1.1419207
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/content/aip/journal/jap/91/1/10.1063/1.1419207
2002-01-01
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Boron penetration and thermal instability of p+ polycrystalline-Si/ZrO2/SiO2/n-Si metal-oxide-semiconductor structures
http://aip.metastore.ingenta.com/content/aip/journal/jap/91/1/10.1063/1.1419207
10.1063/1.1419207
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