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Functional design of a pulsed two-frequency capacitively coupled plasma in for etching
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10.1063/1.1478138
/content/aip/journal/jap/91/12/10.1063/1.1478138
http://aip.metastore.ingenta.com/content/aip/journal/jap/91/12/10.1063/1.1478138
/content/aip/journal/jap/91/12/10.1063/1.1478138
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/content/aip/journal/jap/91/12/10.1063/1.1478138
2002-05-30
2014-10-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Functional design of a pulsed two-frequency capacitively coupled plasma in CF4/Ar for SiO2 etching
http://aip.metastore.ingenta.com/content/aip/journal/jap/91/12/10.1063/1.1478138
10.1063/1.1478138
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