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Comparison of low energy and implants for the fabrication of ultrashallow junctions
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10.1063/1.1433926
/content/aip/journal/jap/91/4/10.1063/1.1433926
http://aip.metastore.ingenta.com/content/aip/journal/jap/91/4/10.1063/1.1433926
/content/aip/journal/jap/91/4/10.1063/1.1433926
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/content/aip/journal/jap/91/4/10.1063/1.1433926
2002-02-15
2014-10-26
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Comparison of low energy BF2+,BCl2+, and BBr2+ implants for the fabrication of ultrashallow P+-N junctions
http://aip.metastore.ingenta.com/content/aip/journal/jap/91/4/10.1063/1.1433926
10.1063/1.1433926
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