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Large-grain polycrystalline silicon films with low intragranular defect density by low-temperature solid-phase crystallization without underlying oxide
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10.1063/1.1448395
/content/aip/journal/jap/91/5/10.1063/1.1448395
http://aip.metastore.ingenta.com/content/aip/journal/jap/91/5/10.1063/1.1448395
/content/aip/journal/jap/91/5/10.1063/1.1448395
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/content/aip/journal/jap/91/5/10.1063/1.1448395
2002-03-01
2015-03-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Large-grain polycrystalline silicon films with low intragranular defect density by low-temperature solid-phase crystallization without underlying oxide
http://aip.metastore.ingenta.com/content/aip/journal/jap/91/5/10.1063/1.1448395
10.1063/1.1448395
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