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Volume 92, Issue 4, 15 August 2002
- DEVICE PHYSICS (PACS 85)
92(2002); http://dx.doi.org/10.1063/1.1495075View Description Hide Description
In this article, we explore the properties of as dielectric material for scanning capacitancemicroscopy (SCM). The layers were grown by chemical vapor deposition(CVD) at The low growth temperature together with the good reproducibility of the CVD process and the high dielectric constant make a very promising material for SCM applications. Compared with as dielectric material, much thicker layers can be used resulting in reduced leakage currents and improved signal quality. For and layers having the same thickness, the latter yields higher signals and therefore an enhanced sensitivity. Furthermore, was found to be quite insensitive to parasitic charging effects, which often disturb SCM measurements on samples with layers.