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Insulator surface charging and dissipation during plasma immersion ion implantation using a thin conductive surface film
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10.1063/1.1503149
/content/aip/journal/jap/92/6/10.1063/1.1503149
http://aip.metastore.ingenta.com/content/aip/journal/jap/92/6/10.1063/1.1503149
/content/aip/journal/jap/92/6/10.1063/1.1503149
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/content/aip/journal/jap/92/6/10.1063/1.1503149
2002-08-27
2014-08-28
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Insulator surface charging and dissipation during plasma immersion ion implantation using a thin conductive surface film
http://aip.metastore.ingenta.com/content/aip/journal/jap/92/6/10.1063/1.1503149
10.1063/1.1503149
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