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Different current conduction mechanisms through thin high-k films due to the varying Hf to Ti ratio
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10.1063/1.1702101
/content/aip/journal/jap/95/10/10.1063/1.1702101
http://aip.metastore.ingenta.com/content/aip/journal/jap/95/10/10.1063/1.1702101
/content/aip/journal/jap/95/10/10.1063/1.1702101
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/content/aip/journal/jap/95/10/10.1063/1.1702101
2004-05-06
2015-07-28
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Different current conduction mechanisms through thin high-kHfxTiySizO films due to the varying Hf to Ti ratio
http://aip.metastore.ingenta.com/content/aip/journal/jap/95/10/10.1063/1.1702101
10.1063/1.1702101
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