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Time-resolved reflectance studies of silicon during laser thermal processing of amorphous silicon gates on ultrathin gate oxides
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10.1063/1.1719267
/content/aip/journal/jap/95/11/10.1063/1.1719267
http://aip.metastore.ingenta.com/content/aip/journal/jap/95/11/10.1063/1.1719267
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/content/aip/journal/jap/95/11/10.1063/1.1719267
2004-05-25
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Time-resolved reflectance studies of silicon during laser thermal processing of amorphous silicon gates on ultrathin gate oxides
http://aip.metastore.ingenta.com/content/aip/journal/jap/95/11/10.1063/1.1719267
10.1063/1.1719267
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