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Amorphization/recrystallization of buried amorphous silicon layer induced by oxygen ion implantation
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10.1063/1.1636264
/content/aip/journal/jap/95/3/10.1063/1.1636264
http://aip.metastore.ingenta.com/content/aip/journal/jap/95/3/10.1063/1.1636264
/content/aip/journal/jap/95/3/10.1063/1.1636264
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/content/aip/journal/jap/95/3/10.1063/1.1636264
2004-01-20
2014-10-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Amorphization/recrystallization of buried amorphous silicon layer induced by oxygen ion implantation
http://aip.metastore.ingenta.com/content/aip/journal/jap/95/3/10.1063/1.1636264
10.1063/1.1636264
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