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Growth optimization and electrical characteristics of films on amorphous substrates
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10.1063/1.1637935
/content/aip/journal/jap/95/3/10.1063/1.1637935
http://aip.metastore.ingenta.com/content/aip/journal/jap/95/3/10.1063/1.1637935
/content/aip/journal/jap/95/3/10.1063/1.1637935
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/content/aip/journal/jap/95/3/10.1063/1.1637935
2004-01-20
2014-07-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Growth optimization and electrical characteristics of VO2 films on amorphous SiO2/Si substrates
http://aip.metastore.ingenta.com/content/aip/journal/jap/95/3/10.1063/1.1637935
10.1063/1.1637935
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