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Numerical simulation of metal plasma-immersion ion implantation and deposition on a cone
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10.1063/1.1808919
/content/aip/journal/jap/96/11/10.1063/1.1808919
http://aip.metastore.ingenta.com/content/aip/journal/jap/96/11/10.1063/1.1808919

Figures

Image of FIG. 1.
FIG. 1.

PIII chamber and simulation region.

Image of FIG. 2.
FIG. 2.

Distribution of electrostatic potential. The substrate is illustrated on the bottom-left corner of each figure and the contour lines are equipotentials with the labels representing the multiples of . The substrate in (a) is just the flat stage and the rest consist of the same stage with a cone of (b) 30°, (c) 60°, and (d) 90° pitch angle mounted on it.

Image of FIG. 3.
FIG. 3.

Positive space-charge density. The substrate is illustrated on the bottom-left corner of each figure and the contour lines represent the plasma density with the labels representing the multiples of . The substrate in (a) is just the flat stage and the rest are the flat stages with a cone of (b) 30°, (c) 60°, and (d) 90° pitch angle mounted on it.

Image of FIG. 4.
FIG. 4.

Electron density. The substrate is illustrated on the bottom-left corner of each figure and the contour lines represent the electron density with the labels representing . The substrate in (a) is just the flat stage and the rest are the flat stages with a cone of (b) 30°, (c) 60°, and (d) 90° pitch angle mounted on it.

Image of FIG. 5.
FIG. 5.

Schematic showing the ion flux incident on the cone.

Image of FIG. 6.
FIG. 6.

Ion doses during the prepulse on various substrate shapes as a function of the radial distance. These curves represent the total number of ions received by the substrate per unit area before the PIII bias potential was applied, i.e., during the prepulse. We compare a flat stage (a) with a 30° (b), 60° (c), and 90° (d) pitched cone. The dose plotted was accumulated for of prepulse time. The ion doses on the cone, as calculated by using Eq. (4) with the data from the flat stage, were also plotted.

Image of FIG. 7.
FIG. 7.

Ion doses during the PIII pulse on various substrate shapes as a function of radial distance. These curves represent the total number of ions received by the substrate per unit area while the PIII bias potential was applied. We compare the (a) flat stage with the (b) 30°, (c) 60°, and (d) 90° pitched cone. The dose plotted was accumulated for of the PIII pulse plus rise time.

Image of FIG. 8.
FIG. 8.

Angle-energy spectrum of doses on a flat stage. Doses as a function of impact energy and angle of incidence at (a) the center of the stage and (b) halfway out from the center of the stage. The doses at the peaks are labeled with units of ions .

Image of FIG. 9.
FIG. 9.

Figure shows that for a cone of angle , the angle of incidence of the ions on the surface, , is the complement of , when the ions are not deflected by electric fields in the sheath.

Image of FIG. 10.
FIG. 10.

Angle-energy spectrum of dose on the 90° cone. Dose as a function of impact energy and angle of incidence at the (a) tip of the 90° cone and (b) halfway down the 90° cone. The doses at the peaks are labeled with units of ions .

Image of FIG. 11.
FIG. 11.

Angle-energy spectrum of doses on the 60° cone. Dose as a function of impact energy and angle of incidence at the (a) tip of the 60° cone and (b) halfway down the 60° cone. The doses at the peaks are labeled with units of ions .

Image of FIG. 12.
FIG. 12.

Angle-energy spectrum of doses on the 30° cone. Dose as a function of impact energy and angle of incidence at the (a) tip of the 30° cone and (b) halfway down the 30° cone. The doses at the peaks are labeled with units of ions .

Tables

Generic image for table
Table I.

Cone angles and angles of incidence.

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/content/aip/journal/jap/96/11/10.1063/1.1808919
2004-11-22
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Numerical simulation of metal plasma-immersion ion implantation and deposition on a cone
http://aip.metastore.ingenta.com/content/aip/journal/jap/96/11/10.1063/1.1808919
10.1063/1.1808919
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