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Effect of fluorine incorporation on silicon dioxide prepared by high density plasma chemical vapor deposition with chemistry
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10.1063/1.1767979
/content/aip/journal/jap/96/3/10.1063/1.1767979
http://aip.metastore.ingenta.com/content/aip/journal/jap/96/3/10.1063/1.1767979
/content/aip/journal/jap/96/3/10.1063/1.1767979
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/content/aip/journal/jap/96/3/10.1063/1.1767979
2004-07-26
2014-12-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effect of fluorine incorporation on silicon dioxide prepared by high density plasma chemical vapor deposition with SiH4∕O2∕NF3 chemistry
http://aip.metastore.ingenta.com/content/aip/journal/jap/96/3/10.1063/1.1767979
10.1063/1.1767979
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