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Magnetically soft, high moment grain-refined films: Application to magnetic tunnel junctions
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10.1063/1.1776627
/content/aip/journal/jap/96/5/10.1063/1.1776627
http://aip.metastore.ingenta.com/content/aip/journal/jap/96/5/10.1063/1.1776627

Figures

Image of FIG. 1.
FIG. 1.

Bright field micrographs and the corresponding diffraction patterns for (a) undoped film (sample ), and for the -doped films; (b) sample , (c) sample . Insets show the corresponding selected area diffraction patterns. rings are designated as reflections from the following planes: , , , , . The faint innermost rings seen in all samples can be indexed to a thin surface oxide layer.

Image of FIG. 2.
FIG. 2.

Normalized junction resistances as a function of temperature for a set of four junctions with the same structure: -doped () where is the oxidation time used for the barrier layer.

Image of FIG. 3.
FIG. 3.

(a) TMR measured for a junction sample with the structure: -doped and (b) corresponding VSM hysteresis loop of a planar trilayer film deposited simultaneously with the junction.

Tables

Generic image for table
Table I.

Deposition conditions, film thickness, saturation magnetization recorded at , coercivity (for easy axis, e.a., and hard axis, h.a.) and identified crystalline phases for a set of six single films.

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/content/aip/journal/jap/96/5/10.1063/1.1776627
2004-09-01
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Magnetically soft, high moment grain-refined Fe films: Application to magnetic tunnel junctions
http://aip.metastore.ingenta.com/content/aip/journal/jap/96/5/10.1063/1.1776627
10.1063/1.1776627
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