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Preparation and characterization of ZnO particles embedded in matrix by reactive magnetron sputtering
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10.1063/1.1897493
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    Affiliations:
    1 Center for Advanced Optoelectronic Functional Material Research, Northeast Normal University, Changchun 130024, People’s Republic of China and Key Laboratory of Excited State Processes, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 16 East-South-Lake Avenue, Changchun 130033, People’s Republic of China
    2 Center for Advanced Optoelectronic Functional Material Research, Northeast Normal University, Changchun 130024, People’s Republic of China
    3 Center for Advanced Optoelectronic Functional Material Research, Northeast Normal University, Changchun 130024, People’s Republic of China and Key Laboratory of Excited State Processes, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 16 East-South-Lake Avenue, Changchun 130033, People’s Republic of China
    4 Key Laboratory of Excited State Processes, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 16 East-South-Lake Avenue, Changchun 130033, People’s Republic of China
    a) Author to whom correspondence should be addressed; present address: Center for Advanced Optoelectronic Functional Material Research, Northeast Normal University, Changchun 130024, People’s Republic of China; electronic mail: ycliu@nenu.edu.cn
    J. Appl. Phys. 97, 103509 (2005); http://dx.doi.org/10.1063/1.1897493
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2005-05-02
2014-08-27
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Preparation and characterization of ZnO particles embedded in SiO2 matrix by reactive magnetron sputtering
http://aip.metastore.ingenta.com/content/aip/journal/jap/97/10/10.1063/1.1897493
10.1063/1.1897493
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