Scanning electron micrographs of multilayer elements with aspect ratios of , 6.1, 8.6, and 15.7. The dimensions are , , , and , respectively.
(a) Hysteresis loop and minor loop of an array of multilayer elements with dimensions of (aspect ratio ). The plot has been annotated to show the switching field of the soft layer , and of the hard layer , the minor loop switching field of the soft layer , the interaction field , and the coercivity of the soft layer . (b) Hysteresis loop and minor loop of the unpatterned film measured parallel and perpendicular to the anisotropy induced by the field during sputtering. (c) Hysteresis loops of three patterned samples with aspect ratios , 4.3, and 13.6 and width . (d) Hysteresis loops of two samples with dimensions and , and a sample with dimensions .
Data from patterned samples plotted vs aspect ratio. (a) Soft layer switching field and (b) Hard layer switching field , both measured from the major loop of each sample; (c) Coercivity of the soft layer and (d) interaction field that the hard layer exerts on the soft layer, measured from the minor loop. Dotted lines are provided for clarity. Some of the data sets are divided according to the width range of the elements, which is given in the caption.
Switching astroid measured from the major loop. The data shows the combination of fields along the easy (long) axis and the hard (short) axis required to cause irreversible magnetization reversal. Data is presented for an array of elements with dimensions , and for an array of stripes with width .
Data from and patterned samples plotted vs aspect ratio. (a) Soft layer switching field and (b) Hard layer switching field , both measured from the major loop of each sample. Dotted lines are provided for clarity. The width range of the elements is given in the caption.
Data from magnetic tunnel junction samples. (a) The reversal of the soft layer in an array of elements with dimensions of , measured parallel and perpendicular to the long axis. The upper inset shows a micrograph of the sample, and the lower inset shows the soft layer reversal for the unpatterned film for a field applied parallel to the antiferromagnet pinning direction. (b) The coercivity of the soft (free) layer and the interaction field that the hard layer exerts on the soft layer vs aspect ratio for patterned elements.
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