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Mass-analyzed ion beam study on selectivity of -to-SiN etching and film deposition
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10.1063/1.1854726
/content/aip/journal/jap/97/5/10.1063/1.1854726
http://aip.metastore.ingenta.com/content/aip/journal/jap/97/5/10.1063/1.1854726
/content/aip/journal/jap/97/5/10.1063/1.1854726
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/content/aip/journal/jap/97/5/10.1063/1.1854726
2005-02-10
2014-07-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Mass-analyzed CFx+(x=1,2,3) ion beam study on selectivity of SiO2-to-SiN etching and a-C:F film deposition
http://aip.metastore.ingenta.com/content/aip/journal/jap/97/5/10.1063/1.1854726
10.1063/1.1854726
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