Dependence of the self-bias potential on the root square of the rf power for the synthesized sample sets.
Reflectance (%) vs time traces obtained by LRI during Ag deposition on for the set 1 specimens. The vertical lines mark the beginning (plasma on) and the end (plasma off) of the deposition process.
Ag surface percentage as a function of the applied rf power for the three sample sets. The silver percentage was evaluated including only Ag and Si photopeaks.
(a) GIXRD patterns for the set 3 specimens. The vertical lines indicate the peak positions for bulk silver.40 (b) Average crystallite size vs rf power in the case of the same sample set.
Representative AFM micrographs for two selected specimens: (a) sample 4 (average grain size ); (b) sample 12 (average grain size ). In both cases, the vertical scale is from 0 to 10 nm.
(a) and (b) surface photoelectron peaks for sample 4.
Optical-absorption spectra for samples belonging to (a) set 1 and (b) set 3.
Dependence of the SPR peak position on silver surface percentages obtained by XPS.
Plane-view TEM images of specimen 5.
Plane-view TEM images (a,b) and SAED pattern (c) of sample 9.
Synthesis conditions for Ag/ nanosystems. In all cases, the sputtering time and deposition temperature corresponded to 10 min and 60 °C, respectively. and denote the total pressure and self-bias potential, respectively.
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