A general view of the EBID process: primary electron (PE) and secondary electron (SE), precursor molecules adsorbed , reevaporated , migrated , fragmented , and polymerized .
(a) AFM image of a rectangular-shaped EBID deposition. The paraffin source is away (lower right, not on image). (b) Cross sections and of the EBID deposit.
(a) SEM images of five EBID-deposited posts in each array , and , located 10, 15, and from the paraffin source, respectively. The SEM images were acquired at 30° tilt. The deposition time from left to right was 2, 4, 6, 8, and 10 min, respectively. (b) Posts height vs deposition time and its linear fit.
SEM images of the EBID deposit size vs the exposure size (square area): (a) an exposure area of and (b) an exposure area of .
SEM image of three posts fabricated with SEM “spot mode.” The SEM image was acquired at 30° tilt. The EBID deposition time was 45 s for all three posts and the paraffin source is located from each post.
(a) Bright-field TEM image of a freely suspended EBID structure. (b) EELS spectra of an EBID film deposited at 3-kV accelerating voltage on top of a 50-nm-thick support film and of graphite (HOPG) used as a reference.
A typical Raman spectrum of an EBID film (The dashed lines are the single fitted Gaussian–Lorentzian peaks).
SIMS elemental maps of the rectangular EBID film (nominally) from . The respective maps are (a) carbon and (b) deuterium.
(a) AFM image of the tested EBID sample before nanoindentation tests. (b) A line scan of the sample.
(a) Representative load-displacement curves of indentations made at peak indentation load for EBID films made at 3-, 12-, and 20-kV accelerating voltages, respectively. (b) The hardness and elastic modulus results.
(a) AFM image and (b) a line scan of the residual indentation impression made at a peak indentation load of .
SEM image of a carbonized PAN fiber clamped to an AFM cantilever tip with EBID method: (a) side view and (b) top view at 30° tilt.
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