Index of content:
Volume 98, Issue 1, 01 July 2005
- LASERS, OPTICS, AND OPTOELECTRONICS
Compact high- filters based on one-dimensional photonic crystals containing single-negative materials98(2005); http://dx.doi.org/10.1063/1.1949273View Description Hide Description
A mechanism to design compact high- filters is proposed in this paper, based on the properties of a defect mode in a one-dimensional (1D) photonic crystal composed of alternating layers of negative-permeability material and negative-permittivity material. The eigenfrequency equation for the defect mode is derived by means of the transfer-matrix method, and then, the dependence of the eigenfrequency on the thicknesses of the two host layers and the defect layer is calculated. In contrast to the case for a filter based on a conventional 1D photonic crystal (with positive refractive indices), we find that the quality factor of the filter involved in this paper can be boosted noticeably while the volume of the filter decreases.
A robust design against comb electrode spacing variations for in-plane switching mode thin-film transistor liquid-crystal displays98(2005); http://dx.doi.org/10.1063/1.1949277View Description Hide Description
A method to reduce the transmittance nonuniformity caused by comb electrode spacing variations of in-plane switching mode thin-film transistorliquid-crystal displays is proposed. The method is based on the compensation of the effect of the comb electrode spacing variations with effective driving voltage variation via feed-through voltage in the thin-film transistor addressing. The conditions for this compensation were analyzed theoretically taking into account gate delay (recharging) effects. It was observed that the common dc driving was superior to the common inversion driving in terms of compensation efficiency. An alternative driving method was proposed to enhance the compensation in common inversion driving.
Characterization of buried photonic crystal waveguides and microcavities fabricated by deep ultraviolet lithography98(2005); http://dx.doi.org/10.1063/1.1948507View Description Hide Description
We present results of the optical characterization of siliconphotonic crystal waveguides and microcavities that are completely buried in a silicon dioxide cladding and are fabricated by deep ultraviolet (UV) lithography. The advantages of buried waveguides and deep UV lithography are discussed. Transmission spectra and loss factors for photonic crystal waveguides, as well as quality factors for resonant microcavities, are obtained. The observed characteristics are in good agreement with three-dimensional simulations.