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Ion energy distributions in a pulsed plasma doping system
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10.1063/1.2136211
/content/aip/journal/jap/98/11/10.1063/1.2136211
http://aip.metastore.ingenta.com/content/aip/journal/jap/98/11/10.1063/1.2136211
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Schematic diagram of experimental setup for (a) bulk and (b) for sheath studies.

Image of FIG. 2.
FIG. 2.

(a) Pressure vs bias voltage, and (b) current density as a function of bias voltage for 40 mTorr .

Image of FIG. 3.
FIG. 3.

Current and voltage wave forms in BF3 plasma (a) bias, 40 mTorr, and pulse width and (b) cathode voltage overshoot.

Image of FIG. 4.
FIG. 4.

Calculated sheath for a 200 V dc bias, 1.6 kV HC pulse, and : (a) constant plasma density; (b) time-varying plasma parameters.

Image of FIG. 5.
FIG. 5.

Time-resolved IEDs of ions incident to a cathode surface during the pulse on, bias, with a HC, 30 mTorr, and pulse width: (a) ; (b) ; (c) .

Image of FIG. 6.
FIG. 6.

Time dependence of the plasma characteristics (a) in a 40 mTorr Ar plasma with a bias, HC, pulse, and 500 Hz pulse frequency: plasma potential, electron temperature, and ion density; and (b) in a 20 mTorr plasma with a bias, , and pulse.

Image of FIG. 7.
FIG. 7.

Time-resolved IEDs of ion incident to a grounded anode surface, bias, pulse, and 30 mTorr. (a) Pulse on and (b) pulse off.

Image of FIG. 8.
FIG. 8.

Time-resolved IEDs of ion incident to a grounded anode surface, bias, pulse, and 41 mTorr. (a) Pulse on and (b) pulse off.

Image of FIG. 9.
FIG. 9.

Time evolution of maximum intensity of ion, bias, 41 mTorr and of ion, bias, 30 mTorr.

Image of FIG. 10.
FIG. 10.

Time-averaged mass spectrum measured at the grounded anode surface in , bias, pulse, and 41 mTorr.

Image of FIG. 11.
FIG. 11.

Fractional power deposition as a function of .

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/content/aip/journal/jap/98/11/10.1063/1.2136211
2005-12-08
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Ion energy distributions in a pulsed plasma doping system
http://aip.metastore.ingenta.com/content/aip/journal/jap/98/11/10.1063/1.2136211
10.1063/1.2136211
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