Schematic diagram of experimental setup for (a) bulk and (b) for sheath studies.
(a) Pressure vs bias voltage, and (b) current density as a function of bias voltage for 40 mTorr .
Current and voltage wave forms in BF3 plasma (a) bias, 40 mTorr, and pulse width and (b) cathode voltage overshoot.
Calculated sheath for a 200 V dc bias, 1.6 kV HC pulse, and : (a) constant plasma density; (b) time-varying plasma parameters.
Time-resolved IEDs of ions incident to a cathode surface during the pulse on, bias, with a HC, 30 mTorr, and pulse width: (a) ; (b) ; (c) .
Time dependence of the plasma characteristics (a) in a 40 mTorr Ar plasma with a bias, HC, pulse, and 500 Hz pulse frequency: plasma potential, electron temperature, and ion density; and (b) in a 20 mTorr plasma with a bias, , and pulse.
Time-resolved IEDs of ion incident to a grounded anode surface, bias, pulse, and 30 mTorr. (a) Pulse on and (b) pulse off.
Time-resolved IEDs of ion incident to a grounded anode surface, bias, pulse, and 41 mTorr. (a) Pulse on and (b) pulse off.
Time evolution of maximum intensity of ion, bias, 41 mTorr and of ion, bias, 30 mTorr.
Time-averaged mass spectrum measured at the grounded anode surface in , bias, pulse, and 41 mTorr.
Fractional power deposition as a function of .
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