Simulation of electric field distribution based on the Bethe-Bouwkamp model, when , , and , respectively.
Schematic of NSOM and femtosecond laser integration for nanolithography.
3D AFM image of a nanodot array fabricated by NSOL on a substrate: electrode/Si, with experimental parameters of fs laser/NSOM: setpoint ; pulse delay .
Cell bottom contact diameter as a function of the delivered laser power inspected by the PMT.
AFM profile analysis for nanocell array fabrication on the photoresist of thickness: (a) NSOM setpoint , and exposure time is ; (b) NSOM setpoint , and exposure time is .
AFM profile analysis of dual-peak nanostructure written by NSOL with smaller near-field distance.
AFM characterizations of nanocell in different fabrication processes: open via on (a) photoresist; (b) intermediate wet etching; (c) layer; (d) 3D image of the fabricated cell on with dimensions of surface diameter/bottom diameter/depth .
Schematic cross section of a PCRAM cell.
SEM image of memory cell .
PCRAM programming current as a function of nanocell feature size.
- curve of CRAM cell with , the RESET current is with short pulse width .
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